Search for dissertations about: "contact lithography"

Showing result 1 - 5 of 23 swedish dissertations containing the words contact lithography.

  2. 1. Fabrication of Low-Dimensional Structures in III-V Semiconductors

    Author : Ivan Maximov; Fasta tillståndets fysik; []
    Keywords : NATURVETENSKAP; NATURAL SCIENCES; III-V semiconductors; plasma; etching; aerosol; lithography; quantum dots; quantum well wires; quantum point contact; damage; luminescence; Fysicumarkivet A:1997:Maximov; Halvledarfysik; Semiconductory physics;

    Abstract : The thesis presents studies on the processing technology and the characterization of nanometer-sized and low-dimensional structures in III-V semiconductors. Two major approaches are described: 1) the combination of aerosol technology and plasma etching for the fabrication of quantum dots (QDs) in InP-based materials and 2) the use of high-resolution electron beam lithography and plasma or wet chemical etching to make quantum well wires (QWWs) in both GaAs and InP-based structures. READ MORE

  4. 2. Controlled axonal outgrowth and cell reactions to nanostructures

    Author : Fredrik Johansson; Funktionell zoologi; []
    Keywords : NATURVETENSKAP; NATURAL SCIENCES; Contact guidance; neuron; axon; fibroblast; macrophage; polymethylmethacrylate; porous silicon; nanowire; magnetic; immunoresponse; nanoimprint lithography; haptotaxis;

    Abstract : The interface between living cells and artificial surfaces are highly relevant for biomedical applications such as implants and organized cell growth for tissue reconstruction as well as for basic science purposes. In the present thesis, we have studied axonal guidance on various nano-patterned surfaces such as polymethyl-meth-acrylate, porous silicon and on magnetically aligned Ni nanowires. READ MORE

  5. 3. Development of Nanoimprint Lithography for Applications in Electronics, Photonics and Life-sciences

    Author : Patrick Carlberg; Fasta tillståndets fysik; []
    Keywords : NATURVETENSKAP; NATURAL SCIENCES; Mikroelektronik; Microelectronics; Teknik; ballistic; Technological sciences; Fysik; Physics; nanowire; TBJ; cantilever; IDA electrode; sensors; life-science; lift-off; patterning media; anti-sticking; mold; stamp; process development; thermal imprint; nanoimprint lithography; Biotechnology; Bioteknik; nanotechnology; polymer; nanostructure;

    Abstract : This thesis describes different aspects of nanotechnology manufacturing with nanoimprint lithography (NIL), a relatively new nanofabrication tool capable of high resolution and high throughput. Surface structure creation with NIL is based on mechanical deformation of the patterning material. READ MORE

  6. 4. Silicon nanowire based devices for More than Moore Applications

    Author : Ganesh Jayakumar; Per-Erik Hellström; Mikael Östling; Luca Selmi; KTH; []
    Keywords : silicon nanowire; biosensor; CMOS; sequential integration; lab-on-chip; LOC; high-K; high-K integration on SiNW biosensor; ALD; fluid gate; back gate; SiNW; SiNW pixel matrix; FEOL; pattern transfer lithography; sidewall transfer lithography; STL; multi-target bio detection; BEOL; nanonets; silicon nanonets; SiNN-FET; SiNW-FET; CMOS integration of nanowires; CMOS integration of nanonets; monolithic 3D integration of nanowires; above-IC integration of nanowires; DNA detection using SiNW; SiNW biosensor; dry environment DNA detection; DNA hybridization detection using SiNW; SiNW functionalization; SiNW silanization; SiNW grafting; FEOL integration of SiNW; BEOL integration of SiNW; sequential multiplexed biodetection; biodetection efficiency of SiNW; front end of line integration of SiNW; back end of line integration of SiNW; SiNW dry environment functionalization; APTES cross-linker; accessing SiNW test site; fluorescence microscopy of SiNW; geometry of SiNW; SiNW biosensor variability; top-down fabrication of SiNW; bottom-up fabrication of SiNW; VLS method; ams foundry CMOS process; adding functionality in BEOL process; sensor integration in BEOL process; hafnium oxide; HfO2; aluminium oxide; Al2O3; TiN backgate; Nickel source drain; ISFET; ion sensitive field effect transistor; Overcoming Nernst limit of detection using SiNW; SiNW sub-threshold region operation; ASIC; SOC; SiGe selective epitaxy; epitaxial growth of SiNW; epitaxial growth of nanowires; epitaxial growth of nanonets; nickel silicide contacts; salicide process; high yield SiNW fabrication; high volume SiNW fabrication; silicon ribbon; SiRi pixel; SiRi biosensor; SiRi DNA detection; monolithic 3D integration of nanonets; above-IC integration of nanonets; impact of back gate voltage on silicon nanowire; impact of back gate voltage on SiNW; FDSOI; fully depleted silicon on insulator technology; metal backgate; wafer scale integration of SiNW; wafer scale integration of nanonets; impact of backgate voltage on CMOS inverter circuit; frequency divider; D flip-flop; Informations- och kommunikationsteknik; Information and Communication Technology;

    Abstract : Silicon nanowires (SiNW) are in the spotlight for a few years in the research community as a good candidate for biosensing applications. This is attributed to their small dimensions in nanometer scale that offers high sensitivity, label-free detection and at the same time utilizing small amount of sample. READ MORE

  7. 5. Fabrication, characterization, and modeling of metallic source/drain MOSFETs

    Author : Valur Gudmundsson; Per-Erik Hellström; Yee-Chia Yeo; KTH; []
    Keywords : TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; Metallic source drain; contact resistivity; Monte Carlo; NiSi; PtSi; SOI; UTB; tri-gate; FinFET; multiple-gate; nanowire; MOSFET; CMOS; Schottky barrier; silicide; SALICIDE;

    Abstract : As scaling of CMOS technology continues, the control of parasitic source/drain (S/D) resistance (RSD) is becoming increasingly challenging. In order to control RSD, metallic source/drain MOSFETs have attracted significant attention, due to their low resistivity, abrupt junction and low temperature processing (≤700 °C). READ MORE