Characterization of Ti2AlC coatings deposited with High Velocity Oxy-Fuel and Magnetron Sputtering Techniques

Abstract: This Thesis presents two different deposition techniques for the synthesis of Ti2AlC coatings. First, I have fabricated Ti2AlC coatings by high velocity oxy-fuel (HVOF) spraying. Analysis with scanning electron microscopy (SEM) show dense coatings with thicknesses of ~150 µm when spraying with a MAXTHAL 211TM Ti2AlC powder of size ~38 µm in an H2/O2 gas flow. The films showed good adhesion to stainless steel substrates as determined by bending tests and the hardness was 3-5 GPa. X-ray diffraction (XRD) detected minority phases of Ti3AlC2, TiC, and AlxTiy alloys. The use of a larger powder size of 56 µm resulted in an increased amount of cracks and delaminations in the coatings. This was explained by less melted material, which is needed as a binding material. Second, magnetron sputtering of thin films was performed with a MAXTHAL 211TM Ti2AlC compound target. Depositions were made at substrate temperatures between ambient and 1000 °C. Elastic recoil detection analysis (ERDA) shows that the films exhibit a C composition between 42 and 52 at% which differs from the nominal composition of 25 at% for the Ti2AlC-target. The Al content, in turn, depends on the substrate temperature as Al is likely to start to evaporate around 700 °C. Co-sputtering with Ti target at a temperature of 700 °C, however, yielded Ti2AlC films with only minority contents of TiC. Thus, the addition of Ti is suggested to have two beneficial roles of balancing out excess of C and to retain Al by providing for more stoichiometric Ti2AlC synthesis conditions. Transmission electron microscopy and X-ray pole figures show that the Ti2AlC grains grow in two preferred orientations; epitaxial Ti2AlC (0001) // Al2O3 (0001) and with 37° tilted basal planes of Ti2AlC (101?7) // Al2O3 (0001).