Search for dissertations about: "Anders Hårsta"

Found 4 swedish dissertations containing the words Anders Hårsta.

  2. 1. The crystal chemistry of kappa-phases

    Author : Anders Hårsta; Uppsala universitet; []
    Keywords : NATURAL SCIENCES; NATURVETENSKAP;

    Abstract : .... READ MORE

  4. 2. Metal Oxide Thin Films and Nanostructures Made by ALD

    Author : Mårten Rooth; Anders Hårsta; Jan-Otto Carlsson; Lauri Niinisö; Uppsala universitet; []
    Keywords : Inorganic chemistry; Atomic layer deposition; Metal oxide; Nanostructures; Template deposition; Thin films; Oorganisk kemi;

    Abstract : Thin films of cobalt oxide, iron oxide and niobium oxide, and nanostructured thin films of iron oxide, titanium oxide and multilayered iron oxide/titanium oxide have been deposited by Atomic Layer Deposition (ALD). The metal oxides were grown using the precursor combinations CoI2/O2, Fe(Cp)2/O2, NbI5/O2 and TiI4/H2O. READ MORE

  5. 3. Employing Metal Iodides and Oxygen in ALD and CVD of Functional Metal Oxides

    Author : Jonas Sundqvist; Anders Hårsta; Roy Gordon; Uppsala universitet; []
    Keywords : NATURVETENSKAP; NATURAL SCIENCES; Inorganic chemistry; CVD; ALD; tantalum oxide; hafnium oxide; tin oxide; epitaxy; Ta2O5; HfO2; SnO2; XRD; Oorganisk kemi; Inorganic chemistry; Oorganisk kemi; Inorganic Chemistry; Oorganisk kemi;

    Abstract : Many materials exhibit interesting and novel properties when prepared as thin films. Thin film metal oxides have had an impact on the technological progress of the microelectronics mainly due to their electrical and optical properties. READ MORE

  6. 4. Synthesis and Characterisation of Magnetron Sputtered Alumina-Zirconia Thin Films

    Author : David Huy Trinh; Hans Högberg; Anders Hårsta; Linköpings universitet; []
    Keywords : TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; Alumina; Zirconia; NaKeywords: Alumina; Zirconia; Nanocomposite; Sputtering; Thin-Film; PVD; TEM; EELS; Materials science; Teknisk materialvetenskap;

    Abstract : Alumina-Zirconia thin films were grown on a range of substrates using dual magnetron sputtering. Film growth was achieved at a relatively low temperature of 450 °C and at higher temperatures up to 810 °C. The films were grown on well-defined surfaces such as silicon (100) but also on industrially relevant substrates such as hardmetal (WC-Co). READ MORE