Search for dissertations about: "Chip geometry"

Showing result 1 - 5 of 31 swedish dissertations containing the words Chip geometry.

  1. 1. Characterization & modeling of chip flow angle & morphology in 2D & 3D turning process

    University dissertation from Trollhättan : University West

    Author : Ashwin Moris Devotta; Högskolan Väst.; [2015]
    Keywords : TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; Chip curl; Chip flow; Computed tomography; Chip formation; Machining; Production Technology; Produktionsteknik;

    Abstract : Within manufacturing of metallic components, machining plays an important role and is of vital significance to ensure process reliability. From a cutting tool design perspective,  tool macro geometry  design  based on physics based  numerical modelling  is highly needed  that can predict chip morphology. READ MORE

  2. 2. On the Machining of Involute Helical Gears - Prediction models on tool geometry, cut gear tooth surface topography, chip geometry, and tool cutting forces

    University dissertation from Trollhättan : University West

    Author : Mattias Svahn; Lunds universitet.; Lund University.; [2016]
    Keywords : TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; Gear hobbing; Gear milling; Chip geometry; Cutting forces; Surface topography; Tool wear;

    Abstract : The modern requirements on power transmissions focus on energy efficiency, low noise and dynamic vibrations, and power density. In order to meet these requirements, the gear wheels must be manufactured to very high precision. Additionally, it should be economical to manufacture these gears within the tight requested tolerances. READ MORE

  3. 3. Chip geometry : methods to impact the geometry of market chips

    University dissertation from Trollhättan : University West

    Author : Anders Bjurulf; Sveriges lantbruksuniversitet.; [2006]
    Keywords : ;

    Abstract : .... READ MORE

  4. 4. Silicon nanowire based devices for More than Moore Applications

    University dissertation from Stockholm, Sweden : KTH Royal Institute of Technology

    Author : Ganesh Jayakumar; KTH.; [2018]
    Keywords : TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; silicon nanowire; biosensor; CMOS; sequential integration; lab-on-chip; LOC; high-K; high-K integration on SiNW biosensor; ALD; fluid gate; back gate; SiNW; SiNW pixel matrix; FEOL; pattern transfer lithography; sidewall transfer lithography; STL; multi-target bio detection; BEOL; nanonets; silicon nanonets; SiNN-FET; SiNW-FET; CMOS integration of nanowires; CMOS integration of nanonets; monolithic 3D integration of nanowires; above-IC integration of nanowires; DNA detection using SiNW; SiNW biosensor; dry environment DNA detection; DNA hybridization detection using SiNW; SiNW functionalization; SiNW silanization; SiNW grafting; FEOL integration of SiNW; BEOL integration of SiNW; sequential multiplexed biodetection; biodetection efficiency of SiNW; front end of line integration of SiNW; back end of line integration of SiNW; SiNW dry environment functionalization; APTES cross-linker; accessing SiNW test site; fluorescence microscopy of SiNW; geometry of SiNW; SiNW biosensor variability; top-down fabrication of SiNW; bottom-up fabrication of SiNW; VLS method; ams foundry CMOS process; adding functionality in BEOL process; sensor integration in BEOL process; hafnium oxide; HfO2; aluminium oxide; Al2O3; TiN backgate; Nickel source drain; ISFET; ion sensitive field effect transistor; Overcoming Nernst limit of detection using SiNW; SiNW sub-threshold region operation; ASIC; SOC; SiGe selective epitaxy; epitaxial growth of SiNW; epitaxial growth of nanowires; epitaxial growth of nanonets; nickel silicide contacts; salicide process; high yield SiNW fabrication; high volume SiNW fabrication; silicon ribbon; SiRi pixel; SiRi biosensor; SiRi DNA detection; monolithic 3D integration of nanonets; above-IC integration of nanonets; impact of back gate voltage on silicon nanowire; impact of back gate voltage on SiNW; FDSOI; fully depleted silicon on insulator technology; metal backgate; wafer scale integration of SiNW; wafer scale integration of nanonets; impact of backgate voltage on CMOS inverter circuit; frequency divider; D flip-flop; Informations- och kommunikationsteknik; Information and Communication Technology;

    Abstract : Silicon nanowires (SiNW) are in the spotlight for a few years in the research community as a good candidate for biosensing applications. This is attributed to their small dimensions in nanometer scale that offers high sensitivity, label-free detection and at the same time utilizing small amount of sample. READ MORE

  5. 5. Machinability Testing of Materials in Metal Cutting with Focus on Compacted Graphite Iron and Cutting Fluids

    University dissertation from Stockholm, Sweden : KTH Royal Institute of Technology

    Author : Varun Nayyar; [2012]
    Keywords : TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; UTS.; Boring; Drilling; Cutting Fluid; Turning; Milling; Force; Wear; Force; Torque; Compressed air; CGI; Hardness; Tool Life; Material Properties; Chip Microstructure; Tapping;

    Abstract : Due to the stringent demands for lower emission from trucks require better mechanical properties of the material to be used in the engines. Better efficiency necessitates higher peak pressure in the engines and for traditionally used material, Flake Graphite Iron (FGI), the mechanical properties starts to reach the limit of what the material can withstand. READ MORE