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Showing result 1 - 5 of 20 swedish dissertations matching the above criteria.
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1. Synthesis and Characterization of Transition Metal Diborides
Abstract : This thesis is devoted towards physical vapor deposition (PVD) of thin films of transition-metal (TM) diborides, focused on the material system TiBx, Ti1-xAlxB2-y and CrBx. The metal diborides are a large family of compounds with both metallic and ceramic properties, due to its bonding nature being a mix of covalent and ionic bonds. READ MORE
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2. Carbon based Thin Films Prepared by HiPIMS and DCMS
Abstract : The present thesis focuses on carbon based thin films prepared by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS). The properties of such thin films can be tailored to an extensive variety; the film microstructure, for example, ranges in the presented work from fully amorphous, graphitic films to fullerene like (FL). READ MORE
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3. Reactive High Power Impulse Magnetron Sputtering of Metal Oxides
Abstract : The work presented in this thesis deals with reactive magnetron sputtering processes of metal oxides with a prime focus on high power impulse magnetron sputtering (HiPIMS). The aim of the research is to contribute towards understanding of the fundamental mechanisms governing a reactive HiPIMS process and to investigate their implications on the film growth. READ MORE
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4. Effect of metal ion irradiation on hard coating synthesis by physical vapor deposition
Abstract : The aim of this thesis is to understand and control how the ions in the plasma influence the film growth during thin film deposition processes. Two physical vapor deposition (PVD) techniques are investigated, namely magnetron sputtering and cathodic arc evaporation. READ MORE
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5. Fundamental aspects of HiPIMS under industrial conditions
Abstract : Fundamental aspects of the high power impulse magnetron sputtering (HiPIMS) process and its implication for film growth under industrial conditions have been studied. The emerging HiPIMS technique exhibits a higher plasma density and an enhanced degree of ionisation of sputtered material as compared to conventional direct current magnetron sputtering (DCMS). READ MORE