Search for dissertations about: "High Power Pulsed Magnetron Sputtering"
Showing result 1 - 5 of 15 swedish dissertations containing the words High Power Pulsed Magnetron Sputtering.
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1. Fundamentals of High Power Impulse Magnetron Sputtering
Abstract : In plasma assisted thin film growth, control over the energy and direction of the incoming species is desired. If the growth species are ionized this can be achieved by the use of a substrate bias or a magnetic field. Ions may be accelerated by an applied potential, whereas neutral particles may not. READ MORE
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2. Plasma characterisation in high power pulsed magnetron sputtering
Abstract : In this thesis, plasma parameters including plasma and floating potentials, electron energy distribution function (EEDF) plasma density and electron temperature are studied in a high power pulsed magnetron (HPPM) discharge at different Argon (Ar) gas pressures and different magnetron powers. It is reported that the EEDF during and shortly after the pulse can be represented by a bi-Maxwellian distribution indicating two energy groups of electrons. READ MORE
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3. Modeling High Power Impulse Magnetron Sputtering Discharges
Abstract : HiPIMS, high power impulse magnetron sputtering, is a promising technology that has attracted a lot of attention ever since its appearance. A time-dependent plasma discharge model has been developed for the ionization region in HiPIMS discharges. READ MORE
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4. High power impulse magnetron sputtering under industrial conditions
Abstract : In this thesis, the recent development step of magnetron sputtering, termed high power impulse magnetron sputtering (HiPIMS) has been studied. Compared to conventional magnetron sputtering HiPIMS provides a higher plasma density which can ionise the sputtered material. READ MORE
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5. Modeling and Experimental Studies of High Power Impulse Magnetron Sputtering Discharges
Abstract : HiPIMS, high power impulse magnetron sputtering, is a promising technology that has attracted a lot of attention, ever since it was introduced in 1999. A time-dependent plasma discharge model has been developed for the ionization region (IRM) in HiPIMS discharges. READ MORE