Search for dissertations about: "High power impulse magnetron sputtering HiPIMS"
Showing result 21 - 25 of 33 swedish dissertations containing the words High power impulse magnetron sputtering HiPIMS.
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21. Silicon Oxynitride Thin Films Grown by Reactive HiPIMS
Abstract : Amorphous silicon oxynitride (SiOxNy) thin films were grown by reactive high power impulse magnetron sputtering from a pure silicon target in Ar/N2O plasmas. The elemental composition of the films was shown to depend on the target surface conditions during the film deposition, as well as on the reactive gas flow rate. READ MORE
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22. Magnetron Sputter Epitaxy of GaN Epilayers and Nanorods
Abstract : In this research, electronic-grade GaN(0001) epilayers and nanorods have been grown onto Al2O3(0001) and Si(111) substrates, respectively, by reactive magnetron sputter epitaxy (MSE) using liquid Ga as a sputtering target. MSE, employing ultra high vacuum conditions, high-purity source materials, and lowenergy ion assisted deposition from substrate biasing, is a scalable method, lending itself to large area GaN synthesis. READ MORE
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23. Carbon based Thin Films Prepared by HiPIMS and DCMS
Abstract : The present thesis focuses on carbon based thin films prepared by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS). The properties of such thin films can be tailored to an extensive variety; the film microstructure, for example, ranges in the presented work from fully amorphous, graphitic films to fullerene like (FL). READ MORE
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24. Carbon Nitride and Carbon Fluoride Thin Films Prepared by HiPIMS
Abstract : The present thesis focuses on carbon based thin films prepared by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS). Carbon nitride (CNx: 0 < x < 0.20) as well as carbon fluoride (CFx: 0.16 < x < 0. READ MORE
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25. Plasma Enhanced Chemical- and Physical- Vapor Depositions Using Hollow Cathodes
Abstract : Development of coating deposition technologies, in terms of performance and costs, is an ongoing process. A promising class of deposition technologies are based on hollow cathode discharges. READ MORE