Search for dissertations about: "WF6"

Showing result 1 - 5 of 9 swedish dissertations containing the word WF6.

  2. 1. Muspel and Surtr : CVD system and control program for WF6 chemistry

    Author : Johan Gerdin Hulkko; Mats Boman; Tobias Törndahl; Uppsala universitet; []
    Keywords : NATURVETENSKAP; NATURAL SCIENCES; CVD; W; WN; system; WF6; TiN; control program; LabView; CVD; W; WN; system; WF6; TiN; styrprogram; LabView; Chemistry with specialization in Inorganic Chemistry; Kemi med inriktning mot oorganisk kemi;

    Abstract : CVD (Chemical Vapour Deposition) is an advanced technique for depositing a coating on a substrate. CVD implies that a solid phase is deposited on a normally heated substrate surface using a reactive, gaseous mixture. The reaction gas mixture must be carefully chosen to prevent homogeneous nucleation in the gas phase. READ MORE

  4. 2. Microfabrication of Tungsten, Molybdenum and Tungsten Carbide Rods by Laser-Assisted CVD

    Author : Kajsa Björklund; Tamas Szörényi; Uppsala universitet; []
    Keywords : NATURVETENSKAP; NATURAL SCIENCES; Chemistry; Laser-assisted CVD; tungsten; molybdenum; tungsten carbide; kinetics; field emission; nanocrystalline; Kemi; Chemistry; Kemi; Inorganic Chemistry; oorganisk kemi;

    Abstract : Thin films of refractory metals and carbides have been studied extensively over many years because of their wide range of application. The two major techniques used are Chemical Vapour Deposition (CVD) and Physical Vapour Deposition (PVD). These can result in the deposition of two-dimensional blanket or patterned thin films. READ MORE

  5. 3. Vapor phase deposition of WO and WC

    Author : Per Tägtström; Uppsala universitet; []
    Keywords : NATURVETENSKAP; NATURAL SCIENCES; Chemistry; vapor deposition; ALE; CVD; tungsten oxide; epitaxy; nanocrystals; tungsten carbide; Kemi; Chemistry; Kemi; Inorganic Chemistry; oorganisk kemi;

    Abstract : WO3 and WC are two compounds that are widely used for a number of different thin film applications. In this thesis, these compounds have been deposited using two different deposition methods: atomic layer epitaxy (ALE) and chemical vapor deposition (CVD). READ MORE

  6. 4. Microstructure aspects of transition metal carbide thin films

    Author : Jun Lu; Uppsala universitet; []
    Keywords : NATURVETENSKAP; NATURAL SCIENCES; Chemistry; vapour deposition; transition metal carbide; nanocrystallinity; epitaxy; Kemi; Chemistry; Kemi; Inorganic Chemistry; oorganisk kemi;

    Abstract : Transition metal carbides are important refractory materials used in many thin film applications. In this thesis, several transition metal carbides have been deposited using different chemical vapour deposition (CVD) and evaporation processes. In particular, the phase composition and microstructure of these carbide films have been studied. READ MORE

  7. 5. Material migration in tokamaks: Studies of deposition processes and characterisation of dust particles

    Author : Armin Weckmann; Marek Rubel; Per Petersson; Daniel Primetzhofer; KTH; []
    Keywords : NATURVETENSKAP; NATURAL SCIENCES; tokamak; fusion; plasma; material migration; particle transport; TEXTOR; PWI; plasma-wall interaction; plasma facing components; PFC; PFM; plasma facing materials; ALT limiter; MoF6; tracer experiment; molybdenum hexafluoride; future energy source; fuel retention; deuterium retention;

    Abstract : Thermonuclear fusion may become an attractive future power source. The most promising of all fusion machine concepts is the tokamak. Despite decades of active research, still huge tasks remain before a fusion power plant can go online. One of these important tasks deals with the interaction between the fusion plasma and the reactor wall. READ MORE