Search for dissertations about: "chemical vapor-deposition"
Showing result 1 - 5 of 137 swedish dissertations containing the words chemical vapor-deposition.
-
1. Chemical vapor deposition of hard coatings : Development of W(C,N) coatings for cemented carbide and TiN deposition on a CoCrFeNi substrate
Abstract : There is a constant need for cutting tool material development to be able to machine new materials and improve the metal cutting efficiency. Inserts of indexable cutting tools usually consist of WC-Co cemented carbide (cc) with μm thick layers of ceramic coatings. READ MORE
-
2. Simulations of Silicon Carbide Chemical Vapor Deposition
Abstract : Most of the modern electronics technology is based on the semiconducting material silicon. The increasing demands for smaller electronic devices with improved performance at lower costs drive the conventional silicon technology to its limits. READ MORE
-
3. A Quantum Chemical Exploration of SiC Chemical Vapor Deposition
Abstract : SiC is a wide bandgap semiconductor with many attractive properties. It hasattracted particular attentions in the areas of power and sensor devices as wellas biomedical and biosensor applications. This is owing to its properties suchas large bandgap, high breakdown electric field, high thermal conductivitiesand chemically robustness. READ MORE
-
4. Toward Energy-efficient Physical Vapor Deposition : Routes for Replacing Substrate Heating during Magnetron Sputtering by Employing Metal Ion Irradiation
Abstract : In this Thesis, magnetron sputtering is perfected as an environmental-friendly deposition technique. I performed systematic studies of a novel approach - hybrid high-power impulse and dc magnetron co-sputtering (HiPIMS/DCMS) with metal-ion-synchronized substrate bias pulses. READ MORE
-
5. Surface-Controlled Chemical Vapor Deposition of Silicon Carbide
Abstract : Polycrystalline cubic silicon carbide, 3C-SiC, has long been investigated in the field of hard coating materials. The typical synthesis method for 3C-SiC coatings is thermal chemical vapor deposition (CVD) using either multicomponent precursors, e.g. methyltrichlorosilane, or a combination of single component precursors, e. READ MORE
