Search for dissertations about: "reactive ion etching"

Showing result 1 - 5 of 26 swedish dissertations containing the words reactive ion etching.

  2. 1. Ion beam etching of InP based materials

    Author : Carl-Fredrik Carlström; KTH; []
    Keywords : InP; dry etching; ion beam etching; RIBE; CAIBE; hydrocarbon chemistry; trimethylamine; As P exchange reaction; morphology; low damage; AFM; SCM; annealing;

    Abstract : Dry etching is an important technique for pattern transferin fabrication of most opto-electronic devices, since it canprovide good control of both structure size and shape even on asub-micron scale. Unfortunately, this process step may causedamage to the material which is detrimental to deviceperformance. READ MORE

  4. 2. Two-Dimensional Photonic Crystals in InP-based Materials

    Author : Mikaël Mulot; KTH; []
    Keywords : Photonic crystals; photonic bandgap materials; indium phosphide; dry etching; chemically assisted ion beam etching; reactive ion etching; electron beam lithography; photonic integrated circuits; optical waveguides; resonant cavities; optical filterin;

    Abstract : Photonic crystals (PhCs) are structures periodic in thedielectric constant. They exhibit a photonic bandgap, i.e., arange of wavelengths for which light propagation is forbidden. READ MORE

  5. 3. High-Aspect Ratio Nanofabrication for Hard X-Ray Zone Plates

    Author : Karolis Parfeniukas; Ulrich Vogt; Hans Hertz; Anne Sakdinawat; KTH; []
    Keywords : NATURVETENSKAP; NATURAL SCIENCES; nanofabrication; x-ray optics; zone plate; tungsten; silicon; reactive ion etching; metal-assisted chemical etching; Ronchi test; Fysik; Physics;

    Abstract : Hard x-ray nanoimaging enables structural investigations of new materials for many applications. For high-resolution experiments, zone plate x-ray optics are commonly chosen.Two methods of zone plate nanofabrication are presented in this thesis.Zone plates are circular diffraction gratings with radially decreasing grating period. READ MORE

  6. 4. Source and drain engineering in SiGe-based pMOS transistors

    Author : Christian Isheden; Mikael Östling; Simon Deleonibus; KTH; []
    Keywords : TEKNIK OCH TEKNOLOGIER; ENGINEERING AND TECHNOLOGY; Electronics; SiGe; source drain; shallow junctions; pMOS; process integration; CVD; epitaxy; etching; Ni silicide; contact resistivity; Elektronik; Electronics; Elektronik;

    Abstract : A new shallow junction formation process, based on selective silicon etching followed by selective growth of in situ B-doped SiGe, is presented. The approach is advantageous compared to conventional ion implantation followed by thermal activation, because perfectly abrupt, low resistivity junctions of arbitrary depth can be obtained. READ MORE

  7. 5. Fabrication and Charaterisation of Photonic Integrated Circuits

    Author : Harendra Fernando; KTH; []
    Keywords : Plasma Enhanced Chemical Vapour Deposition PECVD ; Reactive Ion Etching RIE ; Photosensitivity; Bragg-gratings; Optical Add-drop De Multiplexsers;

    Abstract : The past few decades have seen an explosive increase ininformation transfer, fuelled by the enormous growth of theInternet, telecommunication applications, and mass mediasystems in general. Because of the very high bandwidthpotential promised by optical fibre communication technology,the area of all-optical networking has received a great amountof attention. READ MORE