Cathodic arc deposition process

Abstract: This thesis aims to expand the knowledge of fundamental mechanisms that govern the cathodic arc process. The first part of this thesis explores and explains the correlations between a rather unexplored process parameter (i.e. cathode microstructure) and the microstructure of the coatings. The second part of the thesis focuses on discovering and explaining the correlations between process parameters (i.e. arc guiding magnetic field and nitrogen pressure), plasma properties (i.e. plasma density, electron temperature, ion saturation density etc.), and the microstructure of the coatings.Two aspects of the cathode microstructure are explored. The first is the cathode grain size and the second is the disparity among parent phases of the cathode in terms of work function (W.F.) and cohesive energy (C.E.).Two material systems are selected to investigate the effects of the cathode grain size on the microstructure of the coatings. In this research evolution of the microstructure of the cathode surface under the influence of arc has also been studied. The results show that for CrN coatings a decrease in average grain size of Cr cathode is beneficial in terms of reduction in macroparticle density of Cr-N coatings. In the case of powder metallurgically prepared Ti-50 at.% Al cathodes, a decrease in grain size from 1800 μm to 100 μm promotes the intermixing of Ti and Al grains at the cathode surface which resulted in lower macroparticle density of TiAlN coatings, a Ti/Al ratio closer to cathode composition, and improved hardness. However, further reduction in grain size from 100 μm to 10 μm, upon arcing favors a self-sustaining reaction between Ti and Al grains whose end product is the γ phase. This self-sustaining reaction and arc-created holelike features on the cathode surface render the coatings rich in Al and high in macroparticle density which results in reduced hardness.The research in the effects of disparity among the parent phases in terms of W.F. and C.E. of the constituents of Ti-50 at.% Al cathodes on the microstructural evolution of the converted layer and the coating's microstructure shows that the phase which has lower W.F. and C.E. suffers higher erosion. It is also shown that irrespective of the cathode type, the arc guiding magnetic field and the surface geometry of the cathode are two significant factors in controlling the microstructure of TiAlN coatings.The research in finding correlations between the arc guiding magnetic field, plasma density and the microstructure of the coatings show that for a particular arc source assembly the plasma density can be altered by just changing the strength of an electromagnet. A weaker electromagnet strength results in higher plasma density of Ti-67 at.% Al cathode which promotes the growth of dual phase TiAlN coatings, while a stronger magnetic field reduces the plasma density and promotes the growth of single phase TiAIN coatings and a reduction in deposition rate.The research in establishing the correlations between N2 pressure, plasma properties and coatings microstructure reveals that for plasma generated from Ti-50 at.% Al cathode the average charge state of Ti shows a stark increase with an increase in N2 pressure from 0 Pa to 0.07 Pa, and upon further increase in N2 pressure the average charge state gradually decreases. Moreover, the ionization of nitrogen takes place at the expense of Al2+. It has also been observed that the electron density increases with increasing the N2 pressure while the effective electron temperature decreases. Furthermore, the energetic ion flux to the coating's growth front decreases as the N2 pressure is increased which leads to the alteration of growth texture from 220 to 111.