Metall organic vapour phase epitaxy for advanced III-V devices

Author: Nils Nordell; Sture Petersson; Gunnar Landgren; Ferdinand Scholz; Kth; []

Keywords: ENGINEERING AND TECHNOLOGY; TEKNIK OCH TEKNOLOGIER; Metalorganic vapour phase epitaxy MOVPE ; III-V compound semiconductors; epitaxial uniformity; p-type doping profiles; epitaxial regrowth; chlorine-MOVPE; buried heterostructure laser; heterostructure bipolar transistor; Electrical Engineering; Elektro- och systemteknik;

Abstract:

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